Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Bea
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Author: Katia Vutova, Georgi Mladenov
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Pages: 33
Published: 10 years agoRating: Rated: 0 times Rate It
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Book Description
The basic steps when modeling the ion and electron exposure processes in multilevel multicomponent amorphous targets by the simulation of particle penetration into materials and the calculation of the absorbed energy distribution within the targets by means of a software package.