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Hsing-Huang Tseng, Ph.D. Profile

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The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies Engineering by Hsing-Huang Tseng, Ph.D.

The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies

Reads:
43
Pages:
33
Published:
Nov 2013

A study on the obstacles and development of High-k/Metal-Gated Devices for application to Advanced CMOS Technologies

Formats: PDF