The Progress and Challenges of Applying High-k/Metal-Gated Devices to Advanced CMOS Technologies
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Author: Hsing-Huang Tseng, Ph.D.
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Pages: 33
Published: 11 years agoRating: Rated: 0 times Rate It
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Book Description
A study on the obstacles and development of High-k/Metal-Gated Devices for application to Advanced CMOS Technologies